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Intern, Fab 10 ADTS PEE (Chemical Mechanical Polishing)

Singapore, 03, SG

Micron’s vision is to transform how the world uses information to enrich life for all.  Join an inclusive team focused on one thing: using our expertise in the relentless pursuit of innovation for customers and partners. The solutions we create help make everything from virtual reality experiences to breakthroughs in neural networks possible. We do it all while committing to integrity, sustainability, and giving back to our communities. Because doing so can spark the very innovation we are pursuing. 

 

Req. ID: 243402 

 

Are you looking for a career where you contribute to ground breaking discoveries, and state of the art storage technologies? Are you a highly motivated self-starter with strong analytical skills? Nurture, build, and enhance your technological skillset with a dynamic and diverse team at Micron. We foster a culture of openness, encouragement, and transparency. You will perform meaningful work by partnering with fellow engineers to improve our NAND Technology. We are looking for someone with strong communication and interpersonal skills. We encourage you to take the initiative to suggest improvements, ask questions, and pick our brains. Ultimately our goal is a happy work environment, where genuine relationships can be built. Expect to have a good mix of structure, and creative freedom!

As a Process Intern at Micron, you will work on cutting edge Processes in our Manufacturing Site. You are will part of the Process Team where you will learn our industry leading processes and work on how to optimise and improve them

You will get to experience how we maintain area processes by supporting manufacturing and increasing our through put. In this position, you aslo see how we respond to production issues, implement solutions, reduce costs, and improve yields. You will be expected to perform process development work. Additionally, you will use statistical process controls and data analysis to support your project.

 

Responsibilities include, but not limited to:

  • Collaborating with multi-functional teams to identify issues and resolve issues
  • Learn in-depth knowledge of wafer patterning in 3D NAND Production
  • Opportunity to craft and design experiments to produce solutions.
  • During the internship, you will see and learn how a global memory leader operates and runs its operations

Minimum Qualifications:

  • Pursuing a Bachelors degree in Engineering or Science
  • Basic understanding of semiconductor manufacturing
  • Ability to learn quickly in a rapidly changing environment
  • Excellent organizational, analytical skills and attention to detail
  • Superb communication skills

About Us

As the leader in innovative memory solutions, Micron is helping the world make sense of data by delivering technology that is transforming how the world uses information. Through our global brands — Micron, Crucial and Ballistix — we offer the industry’s broadest portfolio. We are the only company manufacturing today’s major memory and storage technologies: DRAM, NAND, NOR and 3D XPoint™ memory. Our solutions are purpose built to leverage the value of data to unlock financial insights, accelerate scientific breakthroughs and enhance communication around the world.

All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status.

 

Internship Project 1 Title: Deriving insights from Consumable wear and tear to improve CMP process stability

§Description: Chemical Mechanical Planarization (CMP) is a process of wafer planarization with the combination of chemical and mechanical forces. Multiple factors such as pad wear rate and temperature can affect process stability. Huge amount of data is being collected during every processed wafer. There are enormous potential to derive insight from these data and pinpoint opportunities for improvement.
§Scope: In this internship, the student will learn focus on the application of pad wear rate and dresser cut rate from CMP equipment to derive insights from this data and further optimized the run-to-run model and extend CMP consumable life. The internship program begins by providing an in-depth knowledge about CMP processes, equipment as well as process integration knowledge on how 3D NAND is designed and produced. After that, the student will apply various statistical tools such as 6 sigma, SPC, and Multivariate Regression to identify and implement potential improvement for CMP run-to-run process control algorithm. Other key focuses of this internship also includes exploring the use of wafer image recognition algorithm as failure detection for underpolish and overpolish of the wafer.
§Deliverable: Utilizing the pad wear rate and dresser cut rate to improve CMP process capability and extend the consumable life
 

Internship Project 2 Title: An exploration into equipment parameters in slurry coverage optimization on Chemical Mechanical Planarization (CMP) oxide processes

§Description: CMP process is crucial for achieving the 3D NAND performance goals and slurry plays an important role in the process performance which strongly influences the efficiency of planarization. Hence, it is essential to ensure that slurry is distributed effectively during process. In this project, student will gain 1st hand experience of Semiconductor Fab operations and work with Process Engineering team regarding process development and process control methodology used in production environment.
§Scope: Collaborate with the process and equipment engineers to perform in-depth study of factors contributing to slurry distribution during process and further improve the efficiency of planarization by developing recipe with optimized process conditions. Student will have the hands-on opportunity to work on CMP polishing equipment, perform multi-variable Design of Experiment (DOE) to obtain the optimal process conditions and learn how to use statistical tools, fab-specific applications and software for operations/datamining.
§Deliverable: To explore innovative solutions and develop Best Known Method for the identified processes to improve surface topography performance.

 

About Micron Technology, Inc.

We are an industry leader in innovative memory and storage solutions. Through our global brands – Micron® and Crucial® – our broad portfolio of high-performance memory and storage technologies, including DRAM, NAND, 3D XPoint™ memory and NOR, is transforming how the world uses information to enrich life. Backed by more than 40 years of technology leadership, our memory and storage solutions enable disruptive trends, including artificial intelligence, 5G, machine learning and autonomous vehicles, in key market segments like mobile, data center, client, consumer, industrial, graphics, automotive, and networking. Our common stock is traded on the Nasdaq under the MU symbol. To learn more visit micron.com/careers

 

All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status.

 

Micron prohibits the use of child labor and complies with all applicable laws, rules, regulations and other international and industry labor standards.

 

Micron does not charge candidates any recruitment fees or unlawfully collect any other payment from candidates as consideration for their employment with Micron.

 

For US Sites Only: To request assistance with the application process and/or for reasonable accommodations, please contact Micron’s Human Resources Department at 1-800-336-8918 or 208-368-4748 and/or by completing our General Contact Form


Keywords:  Singapore || North West (SG-03) || Singapore (SG) || Frontend Manufacturing || Intern || Internship || Engineering || #LI-JJ1 || Tier 1 || 

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