Fab10N PEE CVD INTN - 3D NAND Film Deposition Process Control Optimisation

Req. ID: 140117 

Title: Develop an efficient control methodology for reliable process control of multi-layer deposition process for 3D NAND

Description: At the heart of advanced 3D NAND memory manufacturing technology, Micron enables vertical stacking of storage cells through the deposition of alternating layers of films with different properties. With multiple layers deposited in-situ, the process control involved is costly and complex and this complexity compounds with an ever increasingly taller stacking.

Scope: Through this project, the student will be exposed to a variety of manufacturing execution systems and learn how to operate a state-of-the-art deposition process to support high volume manufacturing. Harness the power of large data sets from a myriad of sensors to study the effects of process inputs on desired film characteristics. Statistical data analysis, design of experiments (DOE) and other statistical methods will be used in conjunction with technical knowledge to develop possible alternatives for more effective control of the process.

Deliverable: Successfully deploy a more effective control scheme for multi-layer deposition process.

All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status.

For US Sites Only: To request assistance with the application process and/or for reasonable accommodations, please contact Micron’s Human Resources Department at 1-800-336-8918 or 208-368-4748 and/or by completing our General Contact Form

Keywords:  Singapore || North West (SG-03) || Singapore (SG) || Frontend Manufacturing || Intern || Internship || Engineering || #LI-IT1 || Tier 1 ||