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2020 PEE-A Intern - CMP

Singapore, 02, SG

 

Req. ID: 251022 

 

Title: Evaluation of Dual spray bar in Chemical Mechanical Polishing tool.
Description: The single spray bar in the Chemical Mechanical Polishing tool is used to dry the wafer after polish, and wafer on the current process is liable to surface defects after drying. Using a dual spray bar can help to achieve a drier wafer surface and reduce the surface defects on the wafer.
Scope: Perform process characterization for Chemical Mechanical Polish tool fitted with the dual spray bar.  Collaborate with the process engineers to develop and optimize the process conditions for it. Student will be able to learn how to use statistical tools, fab-specific applications and software for operations, datamining; as well as perform Design of Experiment (DOE) to optimize the process/equipment.
Deliverable: Characterization data on the dual spray bar and develop Best Known Method to reduce surface defects on this tool type.

 

All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status.

For US Sites Only: To request assistance with the application process and/or for reasonable accommodations, please contact Micron’s Human Resources Department at 1-800-336-8918 or 208-368-4748 and/or by completing our General Contact Form


Keywords:  Singapore || North East (SG-02) || Singapore (SG) || Frontend Manufacturing || Intern || Internship || Engineering || #LI-JJ1 || Tier 1 || 

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