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2020 Intern- F10 ADTS ATE Study and development of clean bevel in 3D NAND Non-Volatile Memory

Singapore, 03, SG

 

Req. ID: 143069 

 

Title: Study and development of clean bevel in 3D nand Non-Volatile Memory

 

Description: Due to complexity of memory structure, there are a lot of new processes and tools being introduced resulted new type of defects which affecting wafer quality. In this project, student will have exposure on most advance semiconductor machines, gain experience on the state-of-the-art fab operation and attain process development/troubleshooting knowledge as require working with process engineering team on improvement work.

 

Scope:

  • Perform data collection on WiseCam, G6/G7 API, KMAC Bevel Image and KMAC Backside
  • Collaboration with process engineers for process improvement
  • Students will be able to learn how to use statistical tools, fab specific applications and software for process, perform design of experiment to optimize process

Deliverable:

  • Line comb movie of 1XX layers technode
  • Develop Best Known Method to have clean bevel and clean backside

 

All qualified applicants will receive consideration for employment without regard to race, color, religion, sex, sexual orientation, gender identity, national origin, veteran or disability status.

For US Sites Only: To request assistance with the application process and/or for reasonable accommodations, please contact Micron’s Human Resources Department at 1-800-336-8918 or 208-368-4748 and/or by completing our General Contact Form


Keywords:  Singapore || North West (SG-03) || Singapore (SG) || Frontend Manufacturing || Intern || Internship || Manufacturing/Production Operations || #LI-IT1 || Tier 1 || 

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