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2020 Intern - F10 ADTS ATE Process and Equipment Engineering (Dry Etch)

Singapore, 03, SG

Req. ID: 144300 


With the need for even higher aspect ration ‘punch etch’, the latest etch tool have a insitu oxide deposition built in for a conductor etch tool to further protect the sidewall and top of the structure from damage. This project is to study the different oxide dep profile to best protect the sidewall and top structure from over etching. It also need to study the interaction of the etch chamber cleanliness of doing deposition and etching repeatedly on the same tool


We recruit, hire, train, promote, discipline and provide other conditions of employment without regard to a person's race, color, religion, sex, age, national origin, disability, sexual orientation, gender identity and expression, pregnancy, veteran’s status, or other classifications protected under law.  This includes providing reasonable accommodation for team members' disabilities or religious beliefs and practices.

Each manager, supervisor and team member is responsible for carrying out this policy. The EEO Administrator in Human Resources is responsible for administration of this policy. The administrator will monitor compliance and is available to answer any questions on EEO matters.

To request assistance with the application process, please contact Micron’s Human Resources Department at 1-800-336-8918 (or 208-368-4748).

Keywords:  Singapore || North West (SG-03) || Singapore (SG) || Frontend Manufacturing || Intern || Internship || Manufacturing/Production Operations || #LI-IT1 ||

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