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Intern - Dry Etch Process Engineer, NVM

Boise, ID, US


Req. ID: 231441 

Micron Technology’s vision is to transform how the world uses information to enrich life and our commitment to people, innovation, tenacity, collaboration, and customer focus allows us to fulfill our mission to be a global leader in memory and storage solutions. This means conducting business with integrity, accountability, and professionalism while supporting our global community.


As a Process Development Engineer in the Dry Etch Research and Development Group you have the exciting responsibility to design and optimize plasma etch processes for Micron's products. This meaningful position enables you to take ideas from conception through process development all the way to implementation in our production facilities. Micron offers a flexible working environment to maintain a good work, life balance and still meet the demands of our fast paced development and dynamic environment.


Responsibilites Include:

  • Plasma dry etch process characterization, optimization, design, troubleshooting, process transfer, and fundamental research.
  • Collaborate with other groups such as process integration, electrical failure analysis, and manufacturing to ensure robust etch processes can meet the precise physical and electrical requirements.
  • Develop Critical Dimension (CD) tuning processes to reduce line edge roughness and control average CDs and CD uniformity
  • Work with Senior Engineers and vendors to improve existing tool performance and reliability
  • Compare etch performance between different tools
  • Trouble shoot defects or other issues associated with a given etching process or portion of the processing line



  • Intermediate understanding of semiconductor production operations concepts
  • Time management and prioritization skills
  • Good communication and effectively present to a wide variety of audiences
  • Demonstrated ability in multi-tasking and driving complex projects
  • Advanced PC skills and familiarity with MS Office Word, Excel, and PowerPoint
  • Advanced data extraction, analysis, and reporting skills
  • Clear examples of troubleshooting intermediate problems and identify and resolve root causes



Seniors entering graduate school or graduate students with majors in Engineering, Physics, Chemistry, or equivalent degree. Research experience in Plasma Physics or Semiconductor processing is preferred. Candidates must have continued coursework following completion of internship, graduation date should not be prior to December 2021.


About Us


As the leader in innovative memory solutions, Micron is helping the world make sense of data by delivering technology that is transforming how the world uses information. Through our global brands - Micron, Crucial and Ballistix - we offer the industry's broadest portfolio. We are the only company manufacturing today's major memory and storage technologies: DRAM, NAND, NOR and 3D XPoint™ memory. Our solutions are purpose built to leverage the value of data to unlock financial insights, accelerate scientific break throughs and enhance communication around the world.

We recruit, hire, train, promote, discipline and provide other conditions of employment without regard to a person's race, color, religion, sex, age, national origin, disability, sexual orientation, gender identity and expression, pregnancy, veteran’s status, or other classifications protected under law.  This includes providing reasonable accommodation for team members' disabilities or religious beliefs and practices.

Each manager, supervisor and team member is responsible for carrying out this policy. The EEO Administrator in Human Resources is responsible for administration of this policy. The administrator will monitor compliance and is available to answer any questions on EEO matters.

To request assistance with the application process, please contact Micron’s Human Resources Department at 1-800-336-8918 (or 208-368-4748).

Keywords:  Boise || Idaho (US-ID) || United States (US) || Technology Development || Intern || Internship || Engineering || Not Applicable ||

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